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扫描电镜中扫描电路性能及对图像影响分析
电子技术应用
黄宇,王威威,康磊,巩小亮,陈龙
中国电子科技集团公司第四十八研究所
摘要: 扫描电子显微镜(Scanning Electron Microscope, SEM)的图像质量高度依赖于扫描电路输出信号的精度与稳定性。而现有研究对扫描信号至图像质量的影响仍缺乏深入分析。基于此,首先建立了从扫描信号到图像质量的传递机制,分析了扫描信号性能指标对图像影响;然后,通过高精度数字万用表与示波器对实际扫描信号进行精准测量,并结合端点拟合法进行数据处理,从而量化了场扫描与行扫描信号在512×512像素模式下误差水平;进一步通过MATLAB仿真各类误差对标准网格图像的影响,并导入实测信号数据,评估其在实际成像中的表现。研究表明,扫描信号整体线性性能良好,中心区域平均误差为1.884像素,优于边缘区域的2.749像素。
中圖分類號(hào):TN16 文獻(xiàn)標(biāo)志碼:A DOI: 10.16157/j.issn.0258-7998.257241
中文引用格式: 黃宇,王威威,康磊,等. 掃描電鏡中掃描電路性能及對(duì)圖像影響分析[J]. 電子技術(shù)應(yīng)用,2026,52(4):73-77.
英文引用格式: Huang Yu,Wang Weiwei,Kang Lei,et al. Analysis of the impact of scanning circuit performance on images in SEM[J]. Application of Electronic Technique,2026,52(4):73-77.
Analysis of the impact of scanning circuit performance on images in SEM
Huang Yu,Wang Weiwei,Kang Lei,Gong Xiaoliang,Chen Long
The 48th Research Institute of China Electronics Technology Group Corporation
Abstract: The image quality of the Scanning Electron Microscope (SEM) is highly dependent on the accuracy and stability of the output signals from its scanning circuitry. However, the impact of scanning signals on image quality remains insufficiently explored in existing research. To address this, a transmission mechanism from scanning signals to image quality was established, and the influence of scanning signal performance metrics on the image was analyzed. Using high-precision digital multimeters and oscilloscopes, actual scanning signals were accurately measured. Data processed via the endpoint fitting method enabled quantification of error levels in both field and line scanning signals under a 512×512 pixel mode. Furthermore, MATLAB was employed to simulate the impact of various errors on a standard grid image, and measured signal data were imported to evaluate their effect in practical imaging. The results indicate that the scanning signals exhibit good overall linear performance, with an average error of 1.884 pixels in the central region, superior to the 2.749 pixels observed in the peripheral region.
Key words : scanning electron microscope(SEM);scanning circuitry;linearity error;differential nonlinearity(DNL);integral nonlinearity (INL);image quality evaluation

引言

掃描電子顯微鏡(Scanning Electron Microscope, SEM)通過(guò)聚焦電子束掃描樣品表面,探測(cè)二次電子、背散射電子等信號(hào)進(jìn)行圖像生成,能夠以納米級(jí)分辨率呈現(xiàn)樣品的表面形貌與結(jié)構(gòu)信息,已成為生命科學(xué)及納米技術(shù)等領(lǐng)域不可或缺的重要儀器。

目前,高端SEM市場(chǎng)主要由日立、蔡司等國(guó)外公司主導(dǎo),其設(shè)備在分辨率、穩(wěn)定性和自動(dòng)化程度等方面均領(lǐng)先于國(guó)內(nèi)水平。相較之下,國(guó)內(nèi)SEM技術(shù)雖然發(fā)展較快,但由于研發(fā)起步較晚,現(xiàn)有技術(shù)與國(guó)外先進(jìn)水平存在一定差距,尤其是在掃描電路精度與成像等關(guān)鍵環(huán)節(jié)。掃描電路作為SEM中控制電子束精準(zhǔn)定位的關(guān)鍵部分,其輸出信號(hào)的性能直接影響圖像的質(zhì)量。其誤差水平,如失調(diào)誤差、增益誤差、線性誤差,會(huì)通過(guò)掃描放大器和偏轉(zhuǎn)線圈傳遞至圖像,造成圖像產(chǎn)生像移、畸變或固定模式噪聲。此外,關(guān)于SEM的研究主要集中在電子光學(xué)部分,對(duì)從掃描電路性能到圖像質(zhì)量的研究較少。

針對(duì)上述問(wèn)題,本文深入研究掃描電路中掃描信號(hào)的性能測(cè)試方法及其對(duì)SEM圖像質(zhì)量的傳遞機(jī)制。以高精度測(cè)量與建模仿真相結(jié)合的方法,量化掃描信號(hào)的誤差大小并評(píng)估其對(duì)圖像影響程度,以期為國(guó)內(nèi)高性能SEM掃描電路的設(shè)計(jì)與對(duì)圖像的影響提供理論依據(jù)和技術(shù)支撐。


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作者信息:

黃宇,王威威,康磊,鞏小亮,陳龍

(中國(guó)電子科技集團(tuán)公司第四十八研究所,湖南 長(zhǎng)沙 410111)

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